(Reprinted with permission from Wiley-VCH Verlag) Focused Ion Beam Lithography (FIBL) emerged in the late 20th century as a complementary technique to Electron Beam Lithography (EBL). It uses a ...

Focused ion beam (FIB) milling is a nanofabrication technique that ... The integration of FIB with other nanofabrication techniques, such as electron beam lithography and atomic layer deposition, will ...

TwinLITH – Combining the Strengths of EBL and FIB The perfect solution for next-generation nanofabrication is offered when a Raith electron beam lithography tool is integrated with a Raith focused ion ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure Focused Ion Beam (FIB) technology provides ...

The ELPHY MultiBeam includes full multiple method nanopatterning functionality in a single tool for Focused Ion Beam Nanofabrication, Etching and Deposition, Electron Beam Lithography (EBL), Helium ...

When fabricating submicron feature sizes, there is also a need to process materials with a minimum amount of process-induced radiation damage,[2] such as that found in plasma etching or deposition, ...

TwinLITH – Combining the Strengths of FIB and EBL The ideal solution for next-generation nanofabrication is provided when a Raith electron beam lithography tool is combined with a Raith focused ion ...